Principles of Plasma Discharges And Materials Processing

This collection gives broad and up-to-date results in the research and development of materials characterization and processing. Coverage is well-rounded from minerals, metals, and materials characterization and developments in extraction to the fabrication and performance of materials. In addition, topics as varied as structural steels to electronic materials to plant-based composites are explored. The latest research presented in this wide area make this book both timely and relevant to the materials science field as a whole.

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes.

The principal aim of this book is to introduce chemists through a tutorial approach to the use of microwaves by examining several experiments of microwave chemistry and materials processing. It will subsequently enable chemists to fashion their own experiments in microwave chemistry or materials processing.