Sentaurus Lithography

Synopsys, Inc., the world leader in semiconductor design software, is pleased to announce the availability of Sentaurus vO-2018.06-SP2 is a suite of TCAD tools which simulates the fabrication, operation and reliability of semiconductor devices.

This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field.

This book provides a compelling overview of some of the recent advances in lithography. Topics discussed include large-area nanoimprint lithography, optical proximity correction (OPC), micro/nano patterning on polymers

This book provides a systematic description and analysis of laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer, while also presenting typical experimental results and applications. It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength.

This book provides a systematic description and analysis of laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer, while also presenting typical experimental results and applications. It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength.